Electron Beam Evaporator

MAIN APPLICATIONS

  • Surface Science
  • Ultra-thin films
  • Multilayers
  • Doping
  • Sample Preparation
  • Contact Metallization

Part Number Composition

Part Number Composition

 

  • UHV Compatible
  • Evaporation temperature over 3000℃
  • Accurate linear motion: 0.01mm accuracy, 25mm stroke, special design
  • Integrated shutter, fully open without space limitation
  • Reliable flux monitor with external field shielding
  • Easy and fast material reloading

TECHNICAL DATA

Mounting Flange DN40CF (O.D. 2.75”)
Bakeout Temperature 200℃
In Vacuum Diameter 34mm
In Vacuum Length 210 mm standard, 170mm~400mm optional
Number of Pockets 1
Sample Type rod/pellet/powder(crucible available)
Cooling Method Internal watercooling, 1L/min
Flux Monitoring Range 0.1nA~1mA
Filament Current 0~7A (10mA step)
Acceleration Voltage 0~2000V
Max Power 250W
Beam Divergence ±6°
Evaporating Temperature ≥3000℃
Crucible Size 0.1cc, 0.15cc
Crucible Material W/ Mo/Ta/ Graphite/Other material upon request
Rod Size 1~4 mm Dia., 20~100mm Length