MAIN APPLICATIONS
- Surface Science
- Ultra-thin films
- Multilayers
- Doping
- Sample Preparation
- Contact Metallization
Part Number Composition
Electron Beam Evaporator
- UHV Compatible
- Evaporation temperature over 3000℃
- Accurate linear motion: 0.01mm accuracy, 25mm stroke, special design
- Integrated shutter, fully open without space limitation
- Reliable flux monitor with external field shielding
- Easy and fast material reloading
TECHNICAL DATA
| Mounting Flange | DN40CF (O.D. 2.75”) |
| Bakeout Temperature | 200℃ |
| In Vacuum Diameter | 34mm |
| In Vacuum Length | 210 mm standard, 170mm~400mm optional |
| Number of Pockets | 1 |
| Sample Type | rod/pellet/powder(crucible available) |
| Cooling Method | Internal watercooling, 1L/min |
| Flux Monitoring Range | 0.1nA~1mA |
| Filament Current | 0~7A (10mA step) |
| Acceleration Voltage | 0~2000V |
| Max Power | 250W |
| Beam Divergence | ±6° |
| Evaporating Temperature | ≥3000℃ |
| Crucible Size | 0.1cc, 0.15cc |
| Crucible Material | W/ Mo/Ta/ Graphite/Other material upon request |
| Rod Size | 1~4 mm Dia., 20~100mm Length |
